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4 September 2015 Mask and lithography techniques for FPD
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Proceedings Volume 9661, 31st European Mask and Lithography Conference; 966103 (2015) https://doi.org/10.1117/12.2197022
Event: 31st European Mask and Lithography Conference, 2015, Eindhoven, Netherlands
Abstract
Large-field projection lithography for FPDs has developed gradually since the 90s. The LCD screen technology has remained largely unchanged and incremental development has given us better image quality, larger screen sizes, and above all lower cost per area. Recently new types of mobile devices with very high pixel density and/or OLED displays have given rise to dramatically higher requirem ents on photomask technology. Devices with 600 ppi or m ore need lithography with higher optical resolution and better linewidth control. OLED di splays pose new challenges with high sensitivity to transistor parameters and to capacitive cross-talk. New mask requirements leads to new maskwriter requirements and Mycronic has developed a new generation of large -area mask writers with significantly improved properties. This paper discusses and shows data for the improved writers. Mask production to high er quality stan dards also need metrology to verify the quality and Mycronic has introduced a 2D metrology tool with accuracy adequate for current and future masks. New printing or additive methods of producing disp lays on plastic or metal foil will make low-cost disp lays available. This inexpensive type of disp lays will exist side by side with the photographic quality displays of TVs and mobile devices, which will continue to be a challenge in terms of mask and production quality.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
T. Sandstrom, M. Wahlsten, E. Sundelin, G. Hansson, and A. Svensson "Mask and lithography techniques for FPD", Proc. SPIE 9661, 31st European Mask and Lithography Conference, 966103 (4 September 2015); https://doi.org/10.1117/12.2197022
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