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4 September 2015 Fast alternative method for measuring the wavefront of lithography exposure systems
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Proceedings Volume 9661, 31st European Mask and Lithography Conference; 96610J (2015) https://doi.org/10.1117/12.2195334
Event: 31st European Mask and Lithography Conference, 2015, Eindhoven, Netherlands
Abstract
The work presented here describes the analysis of problems of the realization of alternative wavefront measurement methods for lithography exposure machines. The measurement method that is introduced is a redesign of a conventional Shack-Hartmann wavefront sensor and was based on the usage of a single pinhole and the lithography machine itself. Such a redesign is useful because it increases the degrees of freedom. Therefore, there is more freedom to analyze the problems of designing and planning measurements. A group of hardware prototypes under laboratory conditions with the required angular and lateral resolution were realized. For the approximation of the measurement results, numerical simulations are implemented using the Monte-Carlo method in order to statistically design the experiments themselves.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alexander Kabardiadi, Heiko Assmann, Andreas Greiner, Tobias Baselt, Christopher Taudt, and Peter Hartmann "Fast alternative method for measuring the wavefront of lithography exposure systems ", Proc. SPIE 9661, 31st European Mask and Lithography Conference, 96610J (4 September 2015); https://doi.org/10.1117/12.2195334
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