4 September 2015 YieldStar based reticle 3D measurements and its application
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Proceedings Volume 9661, 31st European Mask and Lithography Conference; 96610N (2015) https://doi.org/10.1117/12.2196665
Event: 31st European Mask and Lithography Conference, 2015, Eindhoven, Netherlands
Abstract
YieldStar (YS) is an ASML-built scatterometry tool with well-established capability to measure wafer Critical Dimension (CD), Overlay and Focus. In a feasibility study, the application range of YS was extended to measure CD patterns in EUV reticles (absorber CD, height, Side Wall Angle-SWA). The measured data compared well with the available data from CD-SEM and AFM. Further the YS measured data was used to mathematically separate the reticle induced fingerprint from the scanner fingerprint.
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Vidya Vaenkatesan, Vidya Vaenkatesan, Twan Schellekens, Twan Schellekens, Natalia Davydova, Natalia Davydova, Harm Dillen, Harm Dillen, Joep van Dijk, Joep van Dijk, } "YieldStar based reticle 3D measurements and its application", Proc. SPIE 9661, 31st European Mask and Lithography Conference, 96610N (4 September 2015); doi: 10.1117/12.2196665; https://doi.org/10.1117/12.2196665
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