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15 October 2015 Anodic fluoride passivation of InAs/GaSb type II superlattice infrared detector
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Proceedings Volume 9676, AOPC 2015: Optical Design and Manufacturing Technologies; 967617 (2015) https://doi.org/10.1117/12.2203285
Event: Applied Optics and Photonics China (AOPC2015), 2015, Beijing, China
Abstract
One of the major challenges of InAs/GaSb superlattice devices arises owing to the large number of surface states generated during fabrication processes. Surface passivation and subsequent capping of the surfaces are essential for any practical applicability of this material system. In this paper, we passivated InAs/GaSb superlattice infrared detectors proposed anodic fluoride passivation method. Short and mid wavelength InAs/GaSb superlattice infrared materials were grown by Molecular Beam Epitaxy (MBE) on GaSb (100) substrates. A GaSb buffer layer was grown for optimized superlattice growth condition, which can decrease the occurrence of defects with similar pyramidal structure. The result of auger electron spectroscopy (AES) surface scans after anodic fluoride passivation confirms that anodic fluoride passivation treatment did affect. The leakage current as a function of bias voltage (I-V) for InAs/GaSb superlattice infrared detectors has been examined at 77K. Compared with the unpassivated approach, this passivation methods decrease the dark current by approximately five orders of magnitude.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lixue Zhang, Xiancun Cao, Guansheng Yao, Liang Zhang, Junjie Si, and Weiguo Sun "Anodic fluoride passivation of InAs/GaSb type II superlattice infrared detector", Proc. SPIE 9676, AOPC 2015: Optical Design and Manufacturing Technologies, 967617 (15 October 2015); https://doi.org/10.1117/12.2203285
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