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8 October 2015 Thickness measurement of low reflectance optical thin film with transparent substrate
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Proceedings Volume 9677, AOPC 2015: Optical Test, Measurement, and Equipment; 96770K (2015) https://doi.org/10.1117/12.2197726
Event: Applied Optics and Photonics China (AOPC2015), 2015, Beijing, China
Abstract
Because of the substrate back reflectance phenomena, the reflectance of optical thin film stack on a transparent substrate is totally different from that of on an opaque substrate. In this paper, a method for the measurement of low reflectance optical film thickness that has substrate back reflectance is proposed for the first time. Through the analysis of the actual substrate back reflectance, a compensation model is introduced to reduce the influence of substrate back reflectance. The experimental results show good fitting precision and proves that this model can be used directly for the measurement of the optical film thickness with substrate back reflectance, and no extra process is needed.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Guo Xia, Qianshun Liu, Haiyang Zhou, and Feihong Yu "Thickness measurement of low reflectance optical thin film with transparent substrate", Proc. SPIE 9677, AOPC 2015: Optical Test, Measurement, and Equipment, 96770K (8 October 2015); https://doi.org/10.1117/12.2197726
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