24 October 2016 Study on rejection characteristic of current loop to the base disturbance of optical communication system
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Proceedings Volume 9682, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes; 968214 (2016) https://doi.org/10.1117/12.2244013
Event: Eighth International Symposium on Advanced Optical Manufacturing and Testing Technology (AOMATT2016), 2016, Suzhou, China
Abstract
As laser has narrow transmitting beam and small divergence angle, the LOS (Line of Sight) stabilization of optical communication system is a primary precondition of laser communication links. Compound axis control is usually adopted in LOS stabilization of optical communication system, in which coarse tracking and fine tracking are included. Rejection against high frequency disturbance mainly depends on fine tracking LOS stabilization platform. Limited by different factors such as mechanical characteristic of the stabilization platform and bandwidth/noise of the sensor, the control bandwidth of LOS stabilization platform is restricted so that effective rejection of high frequency disturbance cannot be achieved as it mainly depends on the isolation characteristic of the platform itself. It is proposed by this paper that current loop may reject the effect of back-EMF. By adopting the method of electric control, high frequency isolation characteristic of the platform can be improved. The improvement effect is similar to increasing passive vibration reduction devices. Adopting the double closed loop control structure of velocity and current with the combining of the rejection effect of back-EMF caused by current loop is equivalent to reducing back-EMF coefficient, which can enhance the isolation ability of the LOS stabilization platform to high frequency disturbance.
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Yao Mao, Yao Mao, Chao Deng, Chao Deng, Qiong Liu, Qiong Liu, Zheng Cao, Zheng Cao, } "Study on rejection characteristic of current loop to the base disturbance of optical communication system", Proc. SPIE 9682, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 968214 (24 October 2016); doi: 10.1117/12.2244013; https://doi.org/10.1117/12.2244013
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