28 October 2016 High-precision structure fabrication based on an etching resistance layer
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Proceedings Volume 9683, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 96830C (2016) https://doi.org/10.1117/12.2245685
Event: Eighth International Symposium on Advanced Optical Manufacturing and Testing Technology (AOMATT2016), 2016, Suzhou, China
Abstract
The high-precision fabrication of micro-/nano-structure is a challenge. In this paper, we proposed a new fabrication method of high-precision structure based on an etching resistance layer. The high-precision features were fabricated by photolithography technique, followed by the etching process to transfer the features to the substrate. During this process, the etching uniformity and error lead to the feature distortion. We introduced an etching resistance layer between feature layer and substrate. The etching process will stop when arriving at the resistance layer. Due to the high precision of the plating film, the high-precision structure depth was achieved. In our experiment, we introduced aluminum trioxide as the etching resistance layer. The structures with low depth error of less than 5% were fabricated.
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Man Zhang, Qiling Deng, Lifang Shi, Axiu Cao, Hui Pang, Xin Liu, Jiazhou Wang, Song Hu, "High-precision structure fabrication based on an etching resistance layer", Proc. SPIE 9683, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 96830C (28 October 2016); doi: 10.1117/12.2245685; https://doi.org/10.1117/12.2245685
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