27 September 2016 Sub-nanometer asphere fabrication and testing
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Proceedings Volume 9684, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment; 96840H (2016); doi: 10.1117/12.2245724
Event: Eighth International Symposium on Advanced Optical Manufacturing and Testing Technology (AOMATT2016), 2016, Suzhou, China
Abstract
Lithography projection objective is one of the most precise optical systems in optical manufacture field. The required accuracy of the asphere in the objective is down to nanometer and sub-nanometer, which is a great challenge for optical fabrication and testing. In this paper, the theories and technologies of sub-nanometer asphere fabrication and testing are studied and developed. Combined the sub-nanometer interference testing method and atom level polishing technologies, sub-nanometer aspheres are realized. Two kinds of testing methods are used for the measurement of the asphere and the difference of the results is less than 1nm (RMS).
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Erlong Miao, Songtao Gao, Jian Zhang, Dongqi Su, "Sub-nanometer asphere fabrication and testing", Proc. SPIE 9684, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment, 96840H (27 September 2016); doi: 10.1117/12.2245724; https://doi.org/10.1117/12.2245724
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