27 September 2016 Dual-wavelength method for measuring the thickness of HSQ photoresist
Author Affiliations +
Proceedings Volume 9684, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment; 968442 (2016) https://doi.org/10.1117/12.2246196
Event: Eighth International Symposium on Advanced Optical Manufacturing and Testing Technology (AOMATT2016), 2016, Suzhou, China
Abstract
The reflectivity of thin film changes periodically with the increase of its thickness. According to this effect, we present a dual-wavelength method for measuring the thickness of HSQ film. At first, the refractive index of HSQ was measured by a spectroscopic ellipsometer. Then the relationship between the thickness of HSQ and the reflectivity was deduced. At last, the thickness of HSQ was calculated using the reflectivity measured by a spectrograph. The method was proved to be simple and effective.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shun Yao, Bo Yu, Jingcheng Jin, Chun Li, "Dual-wavelength method for measuring the thickness of HSQ photoresist", Proc. SPIE 9684, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment, 968442 (27 September 2016); doi: 10.1117/12.2246196; https://doi.org/10.1117/12.2246196
PROCEEDINGS
6 PAGES


SHARE
Back to Top