25 October 2016 Topography measurement of micro structure by modulation-based method
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Abstract
Dimensional metrology for micro structure plays an important role in addressing quality issues and observing the performance of micro-fabricated products. Different from the traditional white-light interferometry approach, the modulation-based method is expected to measure topography of micro structure by the obtained modulation of each interferometry image. Through seeking the maximum modulation of every pixel respectively in Z direction, the method could obtain the corresponding height of individual pixel and finally get topography of the structure. Owing to the characteristic of modulation, the proposed method which is not influenced by the change of background light intensity caused by instable light source and different reflection index of the structure could be widely applied with high stability. The paper both illustrates the principle of this novel method and conducts the experiment to verify the feasibility.
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Yi Zhou, Yi Zhou, Yan Tang, Yan Tang, Junbo Liu, Junbo Liu, Qinyuan Deng, Qinyuan Deng, Yiguang Cheng, Yiguang Cheng, Song Hu, Song Hu, } "Topography measurement of micro structure by modulation-based method", Proc. SPIE 9685, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials, 968505 (25 October 2016); doi: 10.1117/12.2243599; https://doi.org/10.1117/12.2243599
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