X-ray microscopy using reflection targets based on SEM with tungsten filament

Junbiao Liu; Yutian Ma; Weixia Zhao; Geng Niu; Mingzhang Chu; Bohua Yin; Li Han; Baodong Liu

doi:10.1117/12.2241728

25 October 2016 X-ray microscopy using reflection targets based on SEM with tungsten filament

Junbiao Liu, Yutian Ma, Weixia Zhao, Geng Niu, Mingzhang Chu, Bohua Yin, Li Han, Baodong Liu

Proceedings Volume 9685, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials; 96850I (2016) https://doi.org/10.1117/12.2241728
Event: Eighth International Symposium on Advanced Optical Manufacturing and Testing Technology (AOMATT2016), 2016, Suzhou, China

Abstract

X-ray MicroandNano imaging is developed based on the conventional x–ray tomography, it can not only provide nondestructive testing with higher resolution measurement, but also be used to examine the material or the structure with low atomic number and low density. The source with micro-focal spot size is one of the key components of x-ray MicroandNano imaging. The focused electron beam from SEM bombarding the metal target can generate x-ray with ultra-small size. It is convenient to set up x-ray microscopy based on SEM for laboratory use. This paper describes a new x-ray microscopy using reflection targets based on FEI Quanta600 SEM with tungsten filament. The flat panel detector is placed outside of the vacuum chamber with 300μm thickness Be-window to isolate vacuum from the air. A stage with 3 DOFs is added to adjust the positions of the target, the SEM’s sample stage is used to move sample. And the shape of target is designed as cone with 60° half cone angle to get the maximum x-ray dosage. The attenuation coefficient of Bewindow for x-ray is about 25%. Finally, the line pair card is used to evaluate the resolution and the result shows that the resolution of the system can receive less than 750nm, when the acceleration voltage is 30keV, the beam current is 160nA, the SEM working distance is 5mm and the acquisition time of the detector is 60s.

Citation Download Citation

Junbiao Liu, Yutian Ma, Weixia Zhao, Geng Niu, Mingzhang Chu, Bohua Yin, Li Han, and Baodong Liu "X-ray microscopy using reflection targets based on SEM with tungsten filament", Proc. SPIE 9685, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials, 96850I (25 October 2016); https://doi.org/10.1117/12.2241728

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KEYWORDS

X-rays

Scanning electron microscopy

Sensors

Electron beams

X-ray microscopy

X-ray detectors

X-ray imaging

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