25 October 2016 UV spectrum-integral Talbot lithography for amplitude periodic micro-grating fabrication
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Abstract
The spectrum-integral Talbot lithography (STIL) was introduced into the fabrication of one-dimensional micro gratings using the broad-band UV illumination in this paper. In the process of spectrum-integral Talbot lithography, the self-images and π-phase-shifted images generated by different wave lengths overlap and integrate collectively to enormously extend the continuous depth-of-focus area since a certain distance away from the mask. As a result, the route of STIL proves to be of great potential for periodic frequency-doubling in good contrast without any complex improvement and operation to the traditional proximity lithographic system of UV mask aligner.
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Qian Deng, Junbo Liu, Shaolin Zhou, Yan Tang, Lixin Zhao, Song Hu, Yinghong Chen, "UV spectrum-integral Talbot lithography for amplitude periodic micro-grating fabrication", Proc. SPIE 9685, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials, 96850M (25 October 2016); doi: 10.1117/12.2243456; https://doi.org/10.1117/12.2243456
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