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25 October 2016 UV spectrum-integral Talbot lithography for amplitude periodic micro-grating fabrication
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The spectrum-integral Talbot lithography (STIL) was introduced into the fabrication of one-dimensional micro gratings using the broad-band UV illumination in this paper. In the process of spectrum-integral Talbot lithography, the self-images and π-phase-shifted images generated by different wave lengths overlap and integrate collectively to enormously extend the continuous depth-of-focus area since a certain distance away from the mask. As a result, the route of STIL proves to be of great potential for periodic frequency-doubling in good contrast without any complex improvement and operation to the traditional proximity lithographic system of UV mask aligner.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Qian Deng, Junbo Liu, Shaolin Zhou, Yan Tang, Lixin Zhao, Song Hu, and Yinghong Chen "UV spectrum-integral Talbot lithography for amplitude periodic micro-grating fabrication", Proc. SPIE 9685, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials, 96850M (25 October 2016);

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