25 October 2016 Design and simulation of large field plate lithography lens
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Because industry demand for LED,LCD panel continues to increase, the high yield of micron-scale resolution lithography is increasingly prominent for manufacturers, which requires the field of lithography objective lens becomes larger. This paper designed a lithography lens with large field, whose effective image side field will reach to 132 × 132mm.Subsequently, the tolerance was analysed by simulation for the optical system. Finally, it is proved that the design meets the requirements of micron-scale resolution.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chao Deng, Chao Deng, Tingwen Xing, Tingwen Xing, Wumei Lin, Wumei Lin, Xianchang Zhu, Xianchang Zhu, } "Design and simulation of large field plate lithography lens", Proc. SPIE 9685, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials, 96850V (25 October 2016); doi: 10.1117/12.2245717; https://doi.org/10.1117/12.2245717


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