25 October 2016 X-ray optics R&D at NSLSII: focus on optical metrology development
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The push for high quality x-ray optics is closely linked to improvements in metrology technology. During the last decade, we have seen an ultra-fast progress in x-ray optics performances. This enhancement is directly linked to the development of the necessary tools to control these optical components. These metrology tools are necessary for the fabrication (to guide some polishing deterministic process) and also for the ultimate characterization used to validate surface parameters (often inside their own mechanical support) prior to installation in a beam line. It is now necessary to characterize optical surface figure, slope errors and roughness on meter-long optics over spatial frequencies as short as 0.1 mm and with slope errors reaching less than 100 nrad rms or surface figure errors close to 1 nm in order to not spoiled and preserve the high brightness made available by third and fourth generation synchrotron/FEL sources like NSLSII or LCLS. For this purpose, the new NSLS-II Optical Metrology Laboratory (NSLSII-OML) includes commercial instruments for measuring long spatial frequency figure errors, mid spatial frequencies and high frequency roughness and had started some research and development activities. This paper provides a brief description of the instruments currently available in the laboratory and gives an overview of the very active research and development efforts within the NSLSII-OML.
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Mourad Idir, Mourad Idir, Lei Huang, Lei Huang, Konstantine Kaznatcheev, Konstantine Kaznatcheev, Shinan Qian, Shinan Qian, Guillaume Dovillaire, Guillaume Dovillaire, Rafael Mayer, Rafael Mayer, "X-ray optics R&D at NSLSII: focus on optical metrology development", Proc. SPIE 9687, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subnanometer Accuracy Measurement for Synchrotron Optics and X-Ray Optics, 96870G (25 October 2016); doi: 10.1117/12.2248223; https://doi.org/10.1117/12.2248223

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