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17 January 1989 Growth Of Diamond By Rf Plasma Assisted Chemical Vapor Deposition
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Abstract
Diamond particles have been produced by inductively coupled radio frequency plasma assisted chemical vapor deposition. Analysis indicates that particles having a thin graphitic surface, as well as diamond particles with no surface coatings have been deposited. Scanning electron microscopy analysis shows that particles are deposited on a pedestal which Auger spectroscopy indicates to be graphitic. This phenomenon has not been previously reported in the literature.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Duane E. Meyer, Natale J. Ianno, John A. Woollam, A. B. Swartzlander, and A. J. Nelson "Growth Of Diamond By Rf Plasma Assisted Chemical Vapor Deposition", Proc. SPIE 0969, Diamond Optics, (17 January 1989); https://doi.org/10.1117/12.948142
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