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16 March 2016 Simple ps microchip Nd:YVO4 laser with 3.3 ps pulses at 0.2 - 1.4 MHz and single-stage amplification to the microjoule level
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Commercial picosecond sources have found widespread applications. Typical system parameters are pulse widths below 20 ps, repetition rates between 0.1 to 2 MHz, and micro Joule level pulse energies. Most systems are based on short pulse modelocked oscillators, regenerative amplifiers, and pockel cells as active beam switches. In contrast we present a completely passive system, consisting of a passively Q-switched microchip laser, a single-stage amplifier, and a pulse compressor. The Q-switched microchip laser has a 50 μm long Nd:YVO4-gain material optically bonded to a 4.6 mm thick undoped YVO4-crystal. It delivers pulse widths of 40 ps and repetition rates of 0.2 – 1.4 MHz at a wavelength of 1.064 μm. The pulse energy is a few nJ. These 40-ps pulses are spectrally broadened in a standard single mode fibre and then compressed in a 24 mm long chirped Bragg grating to as low as 3.3 ps. The repetition rate can be tuned from app. 0.2 to 1.4 MHz by changing the pump power while the pulse width and the pulse energy from the microchip laser are unchanged. The spectral broadening in the fibre is observed throughout the pulse repetition rate, supporting sub-10- ps pulses. Finally, the pulses are amplified in a single-stage Nd:YVO4-amplifier up to the microjoule level (up to 4 μJ pulse energy). As a result the system delivers sub-10-ps pulses at a microjoule level with about 1 MHz repetition rate, and thus fulfills the requirements for ps-micromachining. It does not contain any active switching elements and can be integrated in a very compact setup.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Erdal Türkyilmaz, Jan Lohbreier, Christian Günther, Eva Mehner, Daniel Kopf, Harald Giessen, and Bernd Braun "Simple ps microchip Nd:YVO4 laser with 3.3 ps pulses at 0.2 - 1.4 MHz and single-stage amplification to the microjoule level", Proc. SPIE 9726, Solid State Lasers XXV: Technology and Devices, 97260V (16 March 2016);

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