11 May 2016 Front Matter: Volume 9736
Proceedings Volume 9736, Laser-based Micro- and Nanoprocessing X; 973601 (2016) https://doi.org/10.1117/12.2239299
Event: SPIE LASE, 2016, San Francisco, California, United States
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 9736, including the Title Page, Copyright information, Table of Contents, Introduction (if any), and Conference Committee listing.

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Author(s), "Title of Paper," in Laser-based Micro- and Nanoprocessing X, edited by Udo Klotzbach, Kunihiko Washio, Craig B. Arnold, Proceedings of SPIE Vol. 9736 (SPIE, Bellingham, WA, 2016) Six-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781628419719

Published by SPIE

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Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a six-digit CID article numbering system structured as follows:

  • The first four digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B ... 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.

Authors

Numbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B...0Z, followed by 10-1Z, 20-2Z, etc.

Abramski, Krzysztof M., 09, 1T

Ackermann, Roland, 0T

Antończak, Arkadiusz J., 09, 1T

Ardron, Marcus, 0K

Balčytis, Armandas, 0G

Bayer, L., 1K

Bechtold, Peter, 0L

Beresna, M., 0U

Bergner, Klaus, 0T

Blass, David, 14

Bliedtner, Jens, 19

Bobrinetskiy, Ivan I., 0B

Bonati, Guido, 1P

Booth, M. J., 12

Burgui, Saioa, 11

Cai, Jinguang, 0D, 1D

Carter, Richard M., 15, 1M

Čerkauskaitė, A., 0U

Chen, Jinanyong, 15, 1M

Chen, K., 1S

Delmdahl, Ralph, 1P

Dickmann, Klaus, 0P, 0S

Dilger, Klaus, 0V, 14

Dostalek, M., 1J

Drevinskas, R., 0U

Ehrhardt, M., 1K

Elder, Ian, 15

Emelianov, Alexey V., 0B

Enoki, Shinichi, 1I

Esser, Hans-Gerd, 1P

Esser, M. J. Daniel, 15

Fan, Lidan, 0D

Faucon, M., 0W

Fleureau, M., 0W

Friedel, Susanna, 0F

Friedrich, Maria, 19

Fu, Chien-Chung, 0Y

Gaebler, Frank, 04

Gailevčius, Darius, 08

Gamaly, Eugene, 08

Gil, Carmen, 11

Grefe, Hinrich, 0V

Guenther, Denise, 11

Gurevich, E. L., 0O

Hand, Duncan P., 0K, 15, 1M

Harth, F., 0N

Heber, Jörg, 1G

Heberle, Johannes, 0L

Helbig, Ralf, 11

Held, Andrew, 04

Herrmann, T., 0N

Hevonkorpi, V., 02

Hierl, S., 1J

Hillman, J., 0E

Höche, Thomas, 0C

Hoffman, Hans-Dieter, 14

Hoppius, Jan S., 0O

Huang, X., 1S

Janschek, Klaus, 1G

Jonavičius, Tomas, 08

Jungbluth, Bernd, 14

Juodkazis, Saulius, 08, 0G

Juodkazyte, Jurga, 0G

Kammel, Robert, 0T

Kanitz, A., 0O

Kazansky, P. G., 0U

Kling, R., 0W

Kloetzer, Sascha, 0R

Krause, Michael, 0C

Kreling, Stefan, 0V, 14

Lamb, Robert A., 15

Lang, Valentin, 0Z

Lasa, Inigo, 11

Lasagni, Andrés F., 0Z, 11

L'huillier, J. A., 0N

Li, S., 1S

Li, Xijun, 0G

Lin, Te-Hsun, 0Y

Liu, L., 1S

Loeschner, Udo, 0R

Lorenz, P., 1K

Lu, Y. F., 1S

Lu, Yao, 1S

Lundén, H., 02

Määttänen, A., 02

Malinauskas, Mangirdas, 08

Matsumoto, Aoi, 1I

Meier, Linus, 1O

Miller, D., 0E

Mincuzzi, G., 0W

Mizeikis, Vygantas, 08

Muttaqin, 17

Nakamura, Takahiro, 17

Niaura, Gediminas, 0G

Nolte, Stefan, 0T

Nyga, Sebastian, 14

Ohmura, Etsuji, 1I

Oropeza, M., 0E

Ostendorf, A., 0O

Otero, Nerea, 0B

Patel, A., 0U

Petsch, Tino, 0C

Pezowicz, Celina, 1T

Pfaff, Josquin, 1O

Piontek, M. C., 0N

Qin, Gang, 0D

Rekštyte, Sima, 08

Risser, C., 0E

Roch, Teja, 0Z

Romero, Pablo M., 0B

Roth, Matthias, 1G

Salter, P. S., 12

Sato, Shunichi, 17

Schille, Joerg, 0R

Schindler, Christian, 19

Schmailzl, A., 1J

Schmidt, Michael, 0L

Schneider, Lutz, 0R

Seniutinas, Gediminas, 0G

Skupin, Stefan, 0T

Smarra, Marco, 0P, 0S

Solano, Cristina, 11

Steger, S., 1J

Stępak, Bogusz D., 09, 1T

Stolberg, Klaus, 0F

Strauß, Johannes, 0L

Streek, André, 0R

Strube, Anja, 0S

Sukhman, Y., 0E

Sun, B., 12

Szustakiewicz, Konrad, 1T

Tamaki, Takayuki, 1I

Thomas, Jens U., 0T

Thomson, Robert R., 15, 1M

Toledo-Arana, Alejandro, 11

Troughton, Michael, 15

Valle, Jaoine, 11

van Nunen, Joris, 04

Wagner, Uwe, 0C

Walter, Christian, 1O

Warhanek, Maximilian G., 1O

Watanabe, Akira, 0D, 1D

Wegener, Konrad, 1O

Werner, Carsten, 11

Weston, Nick J., 0K

Westphalen, Thomas, 14

Wlodarczyk, Krystian L., 0K

Wu, Yu-Xiang, 0Y

Yahata, Keisuke, 11

Yang, Yin-Kuang, 0Y

Yu, Chun-Wen, 0Y

Zajadazc, J., 1K

Zhang, J., 0U

Zimmer, K., 1K

Conference Committee

Symposium Chairs

  • Guido Hennig, Daetwyler Graphics AG (Switzerland)

  • Yongfeng Lu, University of Nebraska-Lincoln (United States)

Symposium Co-chairs

  • Reinhart Poprawe, Fraunhofer-Institut für Lasertechnik (Germany)

  • Koji Sugioka, RIKEN (Japan)

Program Track Chairs

  • Henry Helvajian, The Aerospace Corporation (United States)

  • Alberto Piqué, U.S. Naval Research Laboratory (United States)

Conference Chair

  • Udo Klotzbach, Fraunhofer IWS Dresden (Germany)

Conference Co-chairs

  • Kunihiko Washio, Paradigm Laser Research Ltd. (Japan)

  • Craig B. Arnold, Princeton University (United States)

Conference Program Committee

  • Antonio Ancona, CNR-Institute for Photonics and Nanotechnologies (Italy)

  • Arkadiusz J. Antonczak, Wroclaw University of Technology (Poland) Jiyeon Choi, Korea Institute of Machinery & Materials (Korea, Republic of)

  • Francois Courvoisier, FEMTO-ST (France)

  • Chunlei Guo, University of Rochester (United States)

  • Miguel Holgado Bolaños, Universidad Politécnica de Madrid (Spain)

  • Minghui Hong, National University of Singapore (Singapore)

  • Rainer Kling, ALPhANOV (France)

  • Andres F. Lasagni, Fraunhofer IWS Dresden (Germany)

  • Yongfeng Lu, University of Nebraska-Lincoln (United States)

  • Andreas E. H. Oehler, Time-Bandwidth Products JDSU (Switzerland)

  • Yasuhiro Okamoto, Okayama University (Japan)

  • Roberto Osellame, Politecnico di Milano (Italy)

  • Andreas Ostendorf, Ruhr-Universität Bochum (Germany)

  • Wilhelm Pfleging, Karlsruhe Institute of Technology (Germany)

  • Alberto Piqué, U.S. Naval Research Laboratory (United States)

  • Martin Sharp, Liverpool John Moores University (United Kingdom)

  • Razvan Stoian, Laboratoire Hubert Curien (France)

  • Koji Sugioka, RIKEN (Japan)

  • Hong-Bo Sun, Jilin University (China)

  • Jorma Vihinen, Tampere University of Technology (Finland)

  • Akira Watanabe, Tohoku University (Japan)

  • Michael J. Withford, Macquarie University (Australia)

  • Xianfan Xu, Purdue University (United States)

  • Haibin Zhang, Electro Scientific Industries, Inc. (United States)

  • Haiyan Zhao, Tsinghua University (China)

Session Chairs

  • 1 Laser Micro-Structuring and Processing I

    Udo Klotzbach, Fraunhofer IWS Dresden (Germany)

  • 2 Laser Nano-Structuring and Processing

    Haibin Zhang, Electro Scientific Industries, Inc. (United States)

  • 3 Laser Micro-Structuring and Processing II

    François Courvoisier, FEMTO-ST (France)

  • 4 Direct Write Processing, Ablation, and Surface Modification I

    Kunihiko Washio, Paradigm Laser Research Ltd. (Japan)

  • 5 High Speed Laser Beam Engineering Systems for High Power Ultra Short Pulsed Laser I

    Michael J. Withford, Macquarie University (Australia)

  • 6 High Speed Laser Beam Engineering Systems for High Power Ultra Short Pulsed Laser II

    Andrés F. Lasagni, Fraunhofer IWS Dresden (Germany)

  • 7 Direct Write Processing, Ablation, and Surface Modification II: Ultrafast Laser Machining Applications

    Hong-Bo Sun, Jilin University (China)

  • 8 Large Area Micro/Nano Structuring, Laser Interference Patterning

    Chunlei Guo, University of Rochester (United States)

  • 9 Ultrafast Laser Machining Applications I

    Wilhelm Pfleging, Karlsruhe Institute of Technology (Germany)

  • 10 Ultrafast Laser Machining Applications II

    Craig B. Arnold, Princeton University (United States)

  • 11 Advanced Laser Structuring for Energy Storage and Conversion

    Udo Klotzbach, Fraunhofer IWS Dresden (Germany)

© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
} "Front Matter: Volume 9736", Proc. SPIE 9736, Laser-based Micro- and Nanoprocessing X, 973601 (11 May 2016); doi: 10.1117/12.2239299; https://doi.org/10.1117/12.2239299
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