4 March 2016 Photochemical reduction of graphene oxide (GO) by femtosecond laser irradiation
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Proceedings Volume 9736, Laser-based Micro- and Nanoprocessing X; 973617 (2016) https://doi.org/10.1117/12.2211583
Event: SPIE LASE, 2016, San Francisco, California, United States
In this study, we demonstrated a facile method for the reduction of graphene oxide (GO) by applying femtosecond laser pulse irradiation in aqueous colloidal solution. Utilization of femtosecond (fs) laser pulse irradiation enabled us to control GO reduction by adjusting laser fluence and irradiation time. The formation of reduced graphene oxide (rGO) was induced by solvated electrons generated through laser irradiation of colloidal GO solution, which was confirmed by means of UV-visible and Raman spectroscopy, XPS and XRD. By applying an optimum femtosecond laser condition, the interplanar spacing between carbon layers decreased significantly from 9.81 Å to 3.52Å indicating the effective removal of oxygen-containing groups from the basal plane of GO. Furthermore, the sheet resistivity of the fabricated rGO in disk form was 1,200 times lower than GO.
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Muttaqin , Muttaqin , Takahiro Nakamura, Takahiro Nakamura, Shunichi Sato, Shunichi Sato, "Photochemical reduction of graphene oxide (GO) by femtosecond laser irradiation", Proc. SPIE 9736, Laser-based Micro- and Nanoprocessing X, 973617 (4 March 2016); doi: 10.1117/12.2211583; https://doi.org/10.1117/12.2211583

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