27 February 2016 Titanium oxide electron-selective layers for contact passivation of thin-film crystalline silicon solar cells
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Proceedings Volume 9749, Oxide-based Materials and Devices VII; 97491J (2016) https://doi.org/10.1117/12.2213540
Event: SPIE OPTO, 2016, San Francisco, California, United States
Abstract
In crystalline silicon (c-Si) solar cells, carrier selective contacts are among the remaining issues to be addressed in order to reach the theoretical efficiency limit. Especially in ultra-thin-film c-Si solar cells with small volumes and higher carrier concentrations, contact recombination is more critical to the overall performance. In this paper, the advantages of using TiOX as electron-selective layers for contact passivation in c-Si solar cells are analyzed. We characterize the metal/TiOX/n-Si electron-selective contact with the contact recombination factor J0c and the contact resistivity ρc for the first time. Experimental results show that both J0c and ρc decrease after the insertion of TiOX. In addition, the effect of post-deposition rapid-thermal-annealing (RTA) at different temperatures is also evaluated. The best J0c of 5.5 pA/cm2 and the lowest ρc of 13.6 mΩ·cm2 are achieved after the RTA process. This work reveals the potential of TiOX as an electron-selective layer for contact passivation to enable high-efficiency ultra-thin c-Si solar cells with a low cost.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yi Liu, Yi Liu, Yusi Chen, Yusi Chen, David T. LaFehr, David T. LaFehr, Yen Su, Yen Su, Yijie Huo, Yijie Huo, Yangsen Kang, Yangsen Kang, Huiyang Deng, Huiyang Deng, Jieyang Jia, Jieyang Jia, Li Zhao, Li Zhao, Mengyang Yuan, Mengyang Yuan, Zheng Lyu, Zheng Lyu, Daniel DeWitt, Daniel DeWitt, Max A. Vilgalys, Max A. Vilgalys, Kai Zang, Kai Zang, Xiaochi Chen, Xiaochi Chen, Ching-Ying Lu, Ching-Ying Lu, Theodore I. Kamins, Theodore I. Kamins, James S. Harris, James S. Harris, } "Titanium oxide electron-selective layers for contact passivation of thin-film crystalline silicon solar cells", Proc. SPIE 9749, Oxide-based Materials and Devices VII, 97491J (27 February 2016); doi: 10.1117/12.2213540; https://doi.org/10.1117/12.2213540
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