Paper
15 March 2016 Two-dimensional designed fabrication of subwavelength grating HCG mirror on silicon-on-insulator
Author Affiliations +
Proceedings Volume 9757, High Contrast Metastructures V; 97570C (2016) https://doi.org/10.1117/12.2212390
Event: SPIE OPTO, 2016, San Francisco, California, United States
Abstract
We designed and fabricated a two dimensional high contrast subwavelength grating (HCG) mirrors. The computer-aided software was employed to verify the structural parameters including grating periods and filling factors. From the optimized simulation results, the designed HCG structure has a wide reflection stopband (reflectivity (R) >90%) of over 200 nm, which centered at telecommunication wavelength. The optimized HCG mirrors were fabricated by electron beam lithography and inductively coupled plasma process technique. The experimental result was almost consistent with calculated data. This achievement should have an impact on numerous photonic devices helpful attribution to the integrated HCG VCSELs in the future.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shen-Che Huang, Kuo-Bin Hong, Tien-Chang Lu, and Sailing He "Two-dimensional designed fabrication of subwavelength grating HCG mirror on silicon-on-insulator", Proc. SPIE 9757, High Contrast Metastructures V, 97570C (15 March 2016); https://doi.org/10.1117/12.2212390
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KEYWORDS
Mirrors

Optical design

Reflectivity

Silicon

Semiconducting wafers

Computer aided design

Structural design

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