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15 March 2016 The next generation of maskless lithography
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Abstract
The essential goal for fast prototyping of microstructures is to reduce the cycle time. Conventional methods up to now consist of creating designs with a CAD software, then fabricating or purchasing a Photomask and finally using a mask aligner to transfer the pattern to the photoresist. The new Maskless Aligner (MLA) enables to expose the pattern directly without fabricating a mask, which results in a significantly shorter prototyping cycle. To achieve this short prototyping cycle, the MLA has been improved in many aspects compared to other direct write lithography solutions: exposure speed, user interface, ease of operation and flexibility.
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Steffen Diez "The next generation of maskless lithography", Proc. SPIE 9761, Emerging Digital Micromirror Device Based Systems and Applications VIII, 976102 (15 March 2016); https://doi.org/10.1117/12.2211052
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