18 March 2016 Performance of new high-power HVM LPP-EUV source
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We have been developing CO2-Sn-LPP EUV light source which is the most promising solution as the 13.5nm high power light source for HVM EUVL since 2003. Unique original technologies such as; combination of pulsed CO2 laser and Sn droplets, dual wavelength laser pulse shooting and mitigation with magnetic field have been developed in Gigaphoton Inc.. The theoretical and experimental data have clearly showed the advantage of our proposed strategy. We demonstrated 108W EUV power (I/F clean in burst), 80 kHz, 24 hours stable operation at Proto#2 device. Based on these experimental data we are now constructing first practical source for HVM; “GL200E-Pilot#1”. Target of this device is 250 W EUV power by 27 kW pulsed CO2 driver laser system.
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Hakaru Mizoguchi, Hakaru Mizoguchi, Hiroaki Nakarai, Hiroaki Nakarai, Tamotsu Abe, Tamotsu Abe, Krzysztof M. Nowak, Krzysztof M. Nowak, Yasufumi Kawasuji, Yasufumi Kawasuji, Hiroshi Tanaka, Hiroshi Tanaka, Yukio Watanabe, Yukio Watanabe, Tsukasa Hori, Tsukasa Hori, Takeshi Kodama, Takeshi Kodama, Yutaka Shiraishi, Yutaka Shiraishi, Tatsuya Yanagida, Tatsuya Yanagida, Tsuyoshi Yamada, Tsuyoshi Yamada, Taku Yamazaki, Taku Yamazaki, Shinji Okazaki, Shinji Okazaki, Takashi Saitou, Takashi Saitou, "Performance of new high-power HVM LPP-EUV source", Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97760J (18 March 2016); doi: 10.1117/12.2218405; https://doi.org/10.1117/12.2218405

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