18 March 2016 Patterning performance of chemically amplified resist in EUV lithography
Author Affiliations +
Abstract
Extreme Ultra Violet (EUV) lithography is one of the most promising candidate technologies for the high-volume manufacturing (HVM) of semiconductor devices at the sub-14 nm half pitch lines and spaces (LS) pattern for 7 nm node and beyond. EUV resists is strongly required high resolution (R) with high sensitivity (S) and low line edge/ width roughness (L) for HVM application. Experimental results on chemically amplified (CA) resist will be shown to study the influence of proton source, photo acid generator (PAG) cation and the other materials on lithographic performance, and then resist formulation designed for improving RLS trade-off will be discussed.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tatsuya Fujii, Tatsuya Fujii, Shogo Matsumaru, Shogo Matsumaru, Tomotaka Yamada, Tomotaka Yamada, Yoshitaka Komuro, Yoshitaka Komuro, Daisuke Kawana, Daisuke Kawana, Katsumi Ohmori, Katsumi Ohmori, "Patterning performance of chemically amplified resist in EUV lithography", Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97760Y (18 March 2016); doi: 10.1117/12.2218417; https://doi.org/10.1117/12.2218417
PROCEEDINGS
6 PAGES


SHARE
Back to Top