18 March 2016 Polarization aberrations induced by graded multilayer coatings in EUV lithography scanners
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Abstract
The functional form of coating-induced polarization aberrations in EUV lithography systems is evaluated through polarization ray tracing of an example 3×EUV scanner with state-of-the-art graded multilayer coatings. In particular, the impact of coating-induced on-axis astigmatism, as well as diattenuation and retardance on image quality are investigated. The point spread function (PSF) consists of four polarization-dependent components: two are nearly diffraction limited and two are highly apodized, and all components can be described by a Mueller matrix Point Spread Matrix (PSM). The highly apodized components are “ghost” images that are larger than the diffraction limit, reducing image contrast and resolution.
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Thiago S. Jota, Thiago S. Jota, Russell A. Chipman, Russell A. Chipman, "Polarization aberrations induced by graded multilayer coatings in EUV lithography scanners", Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 977617 (18 March 2016); doi: 10.1117/12.2218918; https://doi.org/10.1117/12.2218918
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