18 March 2016 Actinic review of EUV masks: performance data and status of the AIMS EUV System
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Proceedings Volume 9776, Extreme Ultraviolet (EUV) Lithography VII; 97761A (2016); doi: 10.1117/12.2219247
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States
Abstract
The EUV mask infrastructure is of key importance for the successful introduction of EUV lithography into volume production. In particular, for the production of defect free masks an actinic review of potential defect sites is required. ZEISS and the SUNY POLY SEMATECH EUVL Mask Infrastructure consortium started a development program for such an EUV aerial image metrology system, the AIMS EUV. In this paper, we provide measurement data on the system’s key specifications and discuss its performance and capability status.
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Dirk Hellweg, Sascha Perlitz, Krister Magnusson, Renzo Capelli, Markus Koch, Matt Malloy, "Actinic review of EUV masks: performance data and status of the AIMS EUV System", Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97761A (18 March 2016); doi: 10.1117/12.2219247; http://dx.doi.org/10.1117/12.2219247
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KEYWORDS
Extreme ultraviolet

Photomasks

Scanners

Extreme ultraviolet lithography

Particles

Prototyping

Reticles

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