18 March 2016 Actinic review of EUV masks: performance data and status of the AIMS EUV System
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The EUV mask infrastructure is of key importance for the successful introduction of EUV lithography into volume production. In particular, for the production of defect free masks an actinic review of potential defect sites is required. ZEISS and the SUNY POLY SEMATECH EUVL Mask Infrastructure consortium started a development program for such an EUV aerial image metrology system, the AIMS EUV. In this paper, we provide measurement data on the system’s key specifications and discuss its performance and capability status.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dirk Hellweg, Dirk Hellweg, Sascha Perlitz, Sascha Perlitz, Krister Magnusson, Krister Magnusson, Renzo Capelli, Renzo Capelli, Markus Koch, Markus Koch, Matt Malloy, Matt Malloy, "Actinic review of EUV masks: performance data and status of the AIMS EUV System", Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97761A (18 March 2016); doi: 10.1117/12.2219247; https://doi.org/10.1117/12.2219247


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