18 March 2016 Advances in the detection capability on actinic blank inspection
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Abstract
Improvements in the detection capability of a high-volume-manufacturing (HVM) actinic blank inspection (ABI) prototype for native defects caused by illumination numerical aperture (NA) enlargement were evaluated. A mask blank was inspected by varying the illumination NA. The defect signal intensity increased with illumination NA enlargement as predicted from simulation. The mask blank was also inspected with optical tools, and no additional phase defect was detected. All of the printable phase defects were verified to have been detected by the HVM ABI prototype.
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Takeshi Yamane, Takeshi Yamane, Tsuyoshi Amano, Tsuyoshi Amano, Noriaki Takagi, Noriaki Takagi, Hidehiro Watanabe, Hidehiro Watanabe, Ichro Mori, Ichro Mori, Tomohisa Ino, Tomohisa Ino, Tomohiro Suzuki, Tomohiro Suzuki, Kiwamu Takehisa, Kiwamu Takehisa, Hiroki Miyai, Hiroki Miyai, Haruhiko Kusunose, Haruhiko Kusunose, } "Advances in the detection capability on actinic blank inspection", Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97761G (18 March 2016); doi: 10.1117/12.2222747; https://doi.org/10.1117/12.2222747
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