18 March 2016 Study of Gd/Tb LPP emission near λ = 6.7nm for beyond EUV lithography
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Abstract
Plasmas emitting near λ=6.7nm are of interest for beyond EUV lithography (BEUVL). We have conducted a comprehensive study of the spectral characteristics, conversion efficiency, and source size of Gd and Tb laser-produced plasmas over a broad range of laser pulsewidths (120ps-4ns) and irradiation intensities (1.4×1011-6.1×1013W/cm2). The data over the entire parameter range was acquired using a single diode-pumped Yb: YAG laser. The angular distribution of the BEUV emission was measured using an array of calibrated energy-monitors, allowing for an accurate estimate of the BEUV yield. A similar conversion efficiency of 0.47% into a 0.6% bandwidth in 2π solid angle was measured for both Gd and Tb plasma.
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Liang Yin, Liang Yin, Hanchen Wang, Hanchen Wang, Brendan Reagan, Brendan Reagan, Cory Baumgarten, Cory Baumgarten, Vyacheslav Shlyaptsev, Vyacheslav Shlyaptsev, Eric Gullikson, Eric Gullikson, Jorge Rocca, Jorge Rocca, "Study of Gd/Tb LPP emission near λ = 6.7nm for beyond EUV lithography", Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97761M (18 March 2016); doi: 10.1117/12.2219840; https://doi.org/10.1117/12.2219840
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