18 March 2016 NXE pellicle: offering a EUV pellicle solution to the industry
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Abstract
Towards the end of 2014, ASML committed to provide a EUV pellicle solution to the industry. Last year, during SPIE Microlithography 2015, we introduced the NXE pellicle concept, a removable pellicle solution that is compatible with current and future patterned mask inspection methods. This paper shows results of how we took this concept to a complete EUV pellicle solution for the industry. We will highlight some technical design challenges we faced developing the NXE pellicle and how we solved them. We will also present imaging results of pellicle exposures on a 0.33 NA NXE scanner system. In conjunction with the NXE pellicle, we will also present the supporting tooling we have developed to enable pellicle use.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Derk Brouns, Derk Brouns, Aage Bendiksen, Aage Bendiksen, Par Broman, Par Broman, Eric Casimiri, Eric Casimiri, Paul Colsters, Paul Colsters, Peter Delmastro, Peter Delmastro, Dennis de Graaf, Dennis de Graaf, Paul Janssen, Paul Janssen, Mark van de Kerkhof, Mark van de Kerkhof, Ronald Kramer, Ronald Kramer, Matthias Kruizinga, Matthias Kruizinga, Henk Kuntzel, Henk Kuntzel, Frits van der Meulen, Frits van der Meulen, David Ockwell, David Ockwell, Maria Peter, Maria Peter, Daniel Smith, Daniel Smith, Beatrijs Verbrugge, Beatrijs Verbrugge, David van de Weg, David van de Weg, Jim Wiley, Jim Wiley, Noelie Wojewoda, Noelie Wojewoda, Carmen Zoldesi, Carmen Zoldesi, Pieter van Zwol, Pieter van Zwol, } "NXE pellicle: offering a EUV pellicle solution to the industry", Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97761Y (18 March 2016); doi: 10.1117/12.2221909; https://doi.org/10.1117/12.2221909
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