Study of nanometer-thick graphite film for high-power EUVL pellicle

Mun Ja Kim; Hwan Chul Jeon; Roman Chalykh; Eokbong Kim; Jihoon Na; Byung-Gook Kim; Heebom Kim; Chanuk Jeon; Seul-Gi Kim; Dong-Wook Shin; Taesung Kim; Sooyoung Kim; Jung Hun Lee; Ji-Beom Yoo

doi:10.1117/12.2218228

18 March 2016 Study of nanometer-thick graphite film for high-power EUVL pellicle

Mun Ja Kim, Hwan Chul Jeon, Roman Chalykh, Eokbong Kim, Jihoon Na, Byung-Gook Kim, Heebom Kim, Chanuk Jeon, Seul-Gi Kim, Dong-Wook Shin, Taesung Kim, Sooyoung Kim, Jung Hun Lee, Ji-Beom Yoo

Author Affiliations +

Proceedings Volume 9776, Extreme Ultraviolet (EUV) Lithography VII; 97761Z (2016) https://doi.org/10.1117/12.2218228
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Extreme ultraviolet (EUV) lithography has received much attention in the semiconductor industry as a promising candidate to extend dimensional scaling beyond 10nm. Recently EUV pellicle introduction is required to improve particle level inside scanner for EUV mass production. We demonstrate that a new pellicle material, nanometer-thick graphite film (NGF), is one of the best candidates of EUV pellicle membrane. A NGF pellicle with excellent thermal (ε≥0.4 @R.T, <100nm), mechanical (415MPa @~100nm), chemical and optical (24hrs durability under exposure of EUV/H₂ at 4W/cm² with pH₂~5Pa) properties can be a promising and superb candidate for EUV pellicle membrane compared to Si pellicles with capping layers.

Citation Download Citation

Mun Ja Kim, Hwan Chul Jeon, Roman Chalykh, Eokbong Kim, Jihoon Na, Byung-Gook Kim, Heebom Kim, Chanuk Jeon, Seul-Gi Kim, Dong-Wook Shin, Taesung Kim, Sooyoung Kim, Jung Hun Lee, and Ji-Beom Yoo "Study of nanometer-thick graphite film for high-power EUVL pellicle", Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97761Z (18 March 2016); https://doi.org/10.1117/12.2218228

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