18 March 2016 100W EUV light-source key component technology update for HVM
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Abstract
Gigaphoton Inc. develops a high-power laser produced plasma extreme ultraviolet (LPP EUV) light source for high volume manufacturing which enables sub-10nm critical layer patterning for semiconductor device fabrication. A technology update of key components of a 100 W LPP-EUV light source is given in this paper. The key components efficiently produce a stable plasma and evacuate the tin debris from the EUV vessel with a magnetic debris mitigation system. The chosen technology guarantees therefore a high-power and long-life EUV light source system. Each component is described with updated data. The latest system performance results are also presented. They were obtained from our proto LPP-EUV light systems which support 100 W output power.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tsukasa Hori, Tsukasa Hori, Yasufumi Kawasuji, Yasufumi Kawasuji, Hiroshi Tanaka, Hiroshi Tanaka, Yukio Watanabe, Yukio Watanabe, Yutaka Shiraishi, Yutaka Shiraishi, Tamotsu Abe, Tamotsu Abe, Takeshi Okamoto, Takeshi Okamoto, Takeshi Kodama, Takeshi Kodama, Hiroaki Nakarai, Hiroaki Nakarai, Taku Yamazaki, Taku Yamazaki, Shinji Okazaki, Shinji Okazaki, Takashi Saitou, Takashi Saitou, Hakaru Mizoguchi, Hakaru Mizoguchi, "100W EUV light-source key component technology update for HVM", Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 977625 (18 March 2016); doi: 10.1117/12.2217947; https://doi.org/10.1117/12.2217947
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