Update on EUV radiometry at PTB

Christian Laubis; Annett Barboutis; Christian Buchholz; Andreas Fischer; Anton Haase; Florian Knorr; Heiko Mentzel; Jana Puls; Anja Schönstedt; Michael Sintschuk; Victor Soltwisch; Christian Stadelhoff; Frank Scholze

doi:10.1117/12.2218902

18 March 2016 Update on EUV radiometry at PTB

Christian Laubis, Annett Barboutis, Christian Buchholz, Andreas Fischer, Anton Haase, Florian Knorr, Heiko Mentzel, Jana Puls, Anja Schönstedt, Michael Sintschuk, Victor Soltwisch, Christian Stadelhoff, Frank Scholze

Author Affiliations +

Proceedings Volume 9776, Extreme Ultraviolet (EUV) Lithography VII; 977627 (2016) https://doi.org/10.1117/12.2218902
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

The development of technology infrastructure for EUV Lithography (EUVL) still requires higher levels of technology readiness in many fields. A large number of new materials will need to be introduced. For example, development of EUV compatible pellicles to adopt an approved method from optical lithography for EUVL needs completely new thin membranes which have not been available before. To support these developments, PTB with its decades of experience [1] in EUV metrology [2] provides a wide range of actinic and non actinic measurements at in-band EUV wavelengths as well as out of band. Two dedicated, complimentary EUV beamlines [3] are available for radiometric [4,5] characterizations benefiting from small divergence or from adjustable spot size respectively. The wavelength range covered reaches from below 1 nm to 45 nm [6] for the EUV beamlines [7] to longer wavelengths if in addition the VUV beamline is employed. The standard spot size is 1 mm by 1 mm with an option to go as low as 0.1 mm to 0.1 mm. A separate beamline offers an exposure setup. Exposure power levels of 20 W/cm2 have been employed in the past, lower fluencies are available by attenuation or out of focus exposure. Owing to a differential pumping stage, the sample can be held under defined gas conditions during exposure. We present an updated overview on our instrumentation and analysis capabilities for EUV metrology and provide data for illustration.

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Christian Laubis, Annett Barboutis, Christian Buchholz, Andreas Fischer, Anton Haase, Florian Knorr, Heiko Mentzel, Jana Puls, Anja Schönstedt, Michael Sintschuk, Victor Soltwisch, Christian Stadelhoff, and Frank Scholze "Update on EUV radiometry at PTB", Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 977627 (18 March 2016); https://doi.org/10.1117/12.2218902

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