4 April 2016 Sub-15nm patterning technology using directed self-assembly on nano-imprinting guide
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Abstract
In next generation lithography to make sub-15nm pattern, Directed self-assembly (DSA) and Nano-imprint lithography (NIL) are proposed. The current DSA process is complicated and it is difficult to decrease width and line edge roughness of a guide pattern for sub-15nm patterning. In the case of NIL, it is difficult to make the master template having sub- 15nm pattern. This paper describes cost-effective lithography process for making sub-15nm pattern using DSA on a guide pattern replicated by Nano-imprinting (NIL + DSA). Simple process for making sub-15nm pattern is proposed. The quartz templates are made and line/space patterns of half pitch (hp) 12nm and hp9.5nm are obtained by NIL + DSA.
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Seiji Morita, Seiji Morita, Masahiro Kanno, Masahiro Kanno, Ryousuke Yamamoto, Ryousuke Yamamoto, Norikatsu Sasao, Norikatsu Sasao, Shinobu Sugimura, Shinobu Sugimura, "Sub-15nm patterning technology using directed self-assembly on nano-imprinting guide", Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 97770K (4 April 2016); doi: 10.1117/12.2219141; https://doi.org/10.1117/12.2219141
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