Design and fabrication of electrostatic microcolumn in multiple electron-beam lithography

Zhidong Du; Ye Wen; Luis Traverso; Anurup Datta; Chen Chen; Xianfan Xu; Liang Pan

doi:10.1117/12.2219218

22 March 2016 Design and fabrication of electrostatic microcolumn in multiple electron-beam lithography

Zhidong Du, Ye Wen, Luis Traverso, Anurup Datta, Chen Chen, Xianfan Xu, Liang Pan

Proceedings Volume 9777, Alternative Lithographic Technologies VIII; 97771D (2016) https://doi.org/10.1117/12.2219218
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Microcolumns are widely used for parallel electron-beam lithography because of their compactness and the ability to achieve high spatial resolution. A design of an electrostatic microcolumn for our recent nanoscale photoemission sources is presented. We proposed a compact column structure (as short as several microns in length) for the ease of microcolumn fabrication and lithography operation. We numerically studied the influence of several design parameters on the optical performance such as microcolumn diameter, electrode thickness, beam current, working voltages, and working distance. We also examined the effect of fringing field between adjacent microcolumns during parallel lithography operations. The microcolumns were also fabricated to show the possibility.

Citation Download Citation

Zhidong Du, Ye Wen, Luis Traverso, Anurup Datta, Chen Chen, Xianfan Xu, and Liang Pan "Design and fabrication of electrostatic microcolumn in multiple electron-beam lithography", Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 97771D (22 March 2016); https://doi.org/10.1117/12.2219218

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