Translator Disclaimer
22 March 2016 Design and fabrication of electrostatic microcolumn in multiple electron-beam lithography
Author Affiliations +
Abstract
Microcolumns are widely used for parallel electron-beam lithography because of their compactness and the ability to achieve high spatial resolution. A design of an electrostatic microcolumn for our recent nanoscale photoemission sources is presented. We proposed a compact column structure (as short as several microns in length) for the ease of microcolumn fabrication and lithography operation. We numerically studied the influence of several design parameters on the optical performance such as microcolumn diameter, electrode thickness, beam current, working voltages, and working distance. We also examined the effect of fringing field between adjacent microcolumns during parallel lithography operations. The microcolumns were also fabricated to show the possibility.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhidong Du, Ye Wen, Luis Traverso, Anurup Datta, Chen Chen, Xianfan Xu, and Liang Pan "Design and fabrication of electrostatic microcolumn in multiple electron-beam lithography", Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 97771D (22 March 2016); https://doi.org/10.1117/12.2219218
PROCEEDINGS
13 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

Patterning challenges in the sub-10 nm era
Proceedings of SPIE (March 28 2016)
Multi shaped beam (MSB) an evolutionary approach for high...
Proceedings of SPIE (September 24 2010)
X-Ray Lithography: Can It Be Justified
Proceedings of SPIE (June 20 1985)
Mapper: high throughput maskless lithography
Proceedings of SPIE (May 27 2009)
MAPPER: high-throughput maskless lithography
Proceedings of SPIE (March 17 2009)

Back to Top