Paper
1 April 2016 Nanoimprint lithography using disposable biomass template
Makoto Hanabata, Satoshi Takei, Kigen Sugahara, Shinya Nakajima, Naoto Sugino, Takao Kameda, Jiro Fukushima, Yoko Matsumoto, Atsushi Sekiguchi
Author Affiliations +
Abstract
A novel nanoimprint lithography process using disposable biomass template having gas permeability was investigated. It was found that a disposable biomass template derived from cellulose materials shows an excellent gas permeability and decreases transcriptional defects in conventional templates such as quartz, PMDS, DLC that have no gas permeability. We believe that outgasses from imprinted materials are easily removed through the template. The approach to use a cellulose for template material is suitable as the next generation of clean separation technology. It is expected to be one of the defect-less thermal nanoimprint lithographic technologies. It is also expected that volatile materials and solvent including materials become available that often create defects and peelings in conventional temples that have no gas permeability.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Makoto Hanabata, Satoshi Takei, Kigen Sugahara, Shinya Nakajima, Naoto Sugino, Takao Kameda, Jiro Fukushima, Yoko Matsumoto, and Atsushi Sekiguchi "Nanoimprint lithography using disposable biomass template", Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 97771G (1 April 2016); https://doi.org/10.1117/12.2217483
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Cited by 6 scholarly publications.
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KEYWORDS
Nanoimprint lithography

Silicon

Scanning electron microscopy

Lithography

Oxygen

Polymerization

Resistance

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