18 April 2016 Holistic lithography and metrology's importance in driving patterning fidelity
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Abstract
There has been 43 years of overlay metrology in microlithography, and how did we get here? This presentation covered three areas: stepper metrology improvements, improved correction potential, and extended feedback loop outside stepper. The presenter went on to discuss where we are today In terms of holistic lithography, as well as where we are going with the future of holistic lithography.
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Martin van den Brink, Martin van den Brink, "Holistic lithography and metrology's importance in driving patterning fidelity", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 977802 (18 April 2016); doi: 10.1117/12.2225538; https://doi.org/10.1117/12.2225538
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