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21 April 2016 Modeling ellipsometric measurement of novel 3D structures with RCWA and FEM simulations
Samuel O'Mullane; Nick Keller; Alain C. Diebold
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Proceedings Volume 9778, Metrology, Inspection, and Process Control for Microlithography XXX; 977805 (2016) https://doi.org/10.1117/12.2219270
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States
Abstract
Using rigorous coupled wave analysis (RCWA) and finite element method (FEM) simulations together, many interesting ellipsometric measurements can be investigated. This work specifically focuses on simulating copper grating structures that are plasmonically active. Looking at near-field images and Mueller matrix spectra, understanding of physical phenomena is possible. A general strategy for combatting convergence difficulties in RCWA simulations is proposed and applied. The example used is a copper cross-grating structure with known slow convergence.
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Samuel O'Mullane, Nick Keller, and Alain C. Diebold "Modeling ellipsometric measurement of novel 3D structures with RCWA and FEM simulations", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 977805 (21 April 2016); https://doi.org/10.1117/12.2219270
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