Multiple beam ptychography

Robert Karl Jr.; Charles Bevis; Raymond Lopez-Rios; Jonathan Reichanadter; Dennis F. Gardner Jr.; Christina Porter; Elisabeth Shanblatt; Michael Tanksalvala; Giulia F. Mancini; Margaret Murnane; Henry Kapteyn; Daniel Adams

doi:10.1117/12.2220416

21 April 2016 Multiple beam ptychography

Robert Karl Jr., Charles Bevis, Raymond Lopez-Rios, Jonathan Reichanadter, Dennis F. Gardner Jr., Christina Porter, Elisabeth Shanblatt, Michael Tanksalvala, Giulia F. Mancini, Margaret Murnane, Henry Kapteyn, Daniel Adams

Author Affiliations +

Proceedings Volume 9778, Metrology, Inspection, and Process Control for Microlithography XXX; 97780F (2016) https://doi.org/10.1117/12.2220416
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

We present an extension to ptychography that allows simultaneous deconvolution of multiple, spatially separate, illuminating probes. This enables an increased field of view and hence, an increase in imaging throughput, without increased exposure times. This technique can be used for any non-interfering probes: demonstrated with multiple wavelengths and orthogonal polarizations. The latter of which gives us spatially resolved polarization spectroscopy from a single scan.

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Robert Karl Jr., Charles Bevis, Raymond Lopez-Rios, Jonathan Reichanadter, Dennis F. Gardner Jr., Christina Porter, Elisabeth Shanblatt, Michael Tanksalvala, Giulia F. Mancini, Margaret Murnane, Henry Kapteyn, and Daniel Adams "Multiple beam ptychography", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97780F (21 April 2016); https://doi.org/10.1117/12.2220416

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