21 April 2016 Multiple beam ptychography
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We present an extension to ptychography that allows simultaneous deconvolution of multiple, spatially separate, illuminating probes. This enables an increased field of view and hence, an increase in imaging throughput, without increased exposure times. This technique can be used for any non-interfering probes: demonstrated with multiple wavelengths and orthogonal polarizations. The latter of which gives us spatially resolved polarization spectroscopy from a single scan.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert Karl, Robert Karl, Charles Bevis, Charles Bevis, Raymond Lopez-Rios, Raymond Lopez-Rios, Jonathan Reichanadter, Jonathan Reichanadter, Dennis F. Gardner, Dennis F. Gardner, Christina Porter, Christina Porter, Elisabeth Shanblatt, Elisabeth Shanblatt, Michael Tanksalvala, Michael Tanksalvala, Giulia F. Mancini, Giulia F. Mancini, Margaret Murnane, Margaret Murnane, Henry Kapteyn, Henry Kapteyn, Daniel Adams, Daniel Adams, "Multiple beam ptychography", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97780F (21 April 2016); doi: 10.1117/12.2220416; https://doi.org/10.1117/12.2220416

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