8 March 2016 Simultaneous AFM nano-patterning and imaging for photomask repair
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Abstract
In this paper we present a new AFM based nano-patterning technique that can be used for fast defect repairing of high resolution photomasks and possibly other high-speed nano-patterning applications. The proposed method works based on hammering the sample with tapping mode AFM followed by wet cleaning of the residuals. On the area where a specific pattern should be written, the tip-sample interaction force is tuned in a controlled manner by changing the excitation frequency of the cantilever without interrupting the imaging process. Using this method several patterns where transferred to different samples with imaging speed. While the pattern was transferred to the sample in each tracing scan line, the patterned sample was imaged in retracing scan line, thus the outcome was immediately visible during the experiment.
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Aliasghar Keyvani, Aliasghar Keyvani, Mehmet S. Tamer, Mehmet S. Tamer, Maarten H. van Es, Maarten H. van Es, Hamed Sadeghian, Hamed Sadeghian, "Simultaneous AFM nano-patterning and imaging for photomask repair", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 977818 (8 March 2016); doi: 10.1117/12.2219041; https://doi.org/10.1117/12.2219041
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