To enable this, a highly stable Atomic Force Microscope system is being developed. The probe is positioned relative to the wafer with a 6DOF controlled hexapod stage, which has a relatively large positioning range of 8x8mm. The position and orientation of this stage is measured relative to the wafer using 6 interferometers via a highly stable metrology frame. A tilted probe concept is utilized to allow profiling of the high aspect ratio marker and device features. Current activities are aimed at demonstrating the measurement capabilities of the developed AFM system.
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Stefan Kuiper, Erik Fritz, Will Crowcombe, Thomas Liebig, Geerten Kramer, Gert Witvoet, Tom Duivenvoorde, Ton Overtoom, Ramon Rijnbeek, Erwin van Zwet, Anton van Dijsseldonk, Arie den Boef, Marcel Beems, Leon Levasier, "Large dynamic range Atomic Force Microscope for overlay improvements," Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97781B (8 March 2016);