24 March 2016 A study of swing-curve physics in diffraction-based overlay
Author Affiliations +
With the increase of process complexity in advanced nodes, the requirements of process robustness in overlay metrology continues to tighten. Especially with the introduction of newer materials in the film-stack along with typical stack variations (thickness, optical properties, profile asymmetry etc.), the signal formation physics in diffraction-based overlay (DBO) becomes an important aspect to apply in overlay metrology target and recipe selection.

In order to address the signal formation physics, an effort is made towards studying the swing-curve phenomena through wavelength and polarizations on production stacks using simulations as well as experimental technique using DBO. The results provide a wealth of information on target and recipe selection for robustness. Details from simulation and measurements will be reported in this technical publication.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kaustuve Bhattacharyya, Kaustuve Bhattacharyya, Arie den Boef, Arie den Boef, Greet Storms, Greet Storms, Joost van Heijst, Joost van Heijst, Marc Noot, Marc Noot, Kevin An, Kevin An, Noh-Kyoung Park, Noh-Kyoung Park, Se-Ra Jeon, Se-Ra Jeon, Nang-Lyeom Oh, Nang-Lyeom Oh, Elliott McNamara, Elliott McNamara, Frank van de Mast, Frank van de Mast, SeungHwa Oh, SeungHwa Oh, Seung Yoon Lee, Seung Yoon Lee, Chan Hwang, Chan Hwang, Kuntack Lee, Kuntack Lee, } "A study of swing-curve physics in diffraction-based overlay", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97781I (24 March 2016); doi: 10.1117/12.2222040; https://doi.org/10.1117/12.2222040


Device overlay method for high volume manufacturing
Proceedings of SPIE (March 17 2016)
Accuracy in optical overlay metrology
Proceedings of SPIE (March 23 2016)
Overlay metrology for low-k1: challenges and solutions
Proceedings of SPIE (March 12 2012)
Scatterometric process monitor for silylation
Proceedings of SPIE (July 06 1997)
Achieving optimum diffraction based overlay performance
Proceedings of SPIE (April 01 2010)

Back to Top