In this paper, we are going to certify that the overlay values extracted from optical measurement cannot represent the circuit level overlay values. We will also demonstrate the possibility to correct misregistration between two layers using the overlay data obtained from the DBM system.
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Gyoyeon Jo, Sunkeun Ji, Shinyoung Kim, Hyunwoo Kang, Minwoo Park, Sangwoo Kim, Jungchan Kim, Chanha Park, Hyunjo Yang, Kotaro Maruyama, Byungjun Park, "Enhacement of intrafield overlay using a design based metrology system," Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97781J (24 March 2016);