8 March 2016 Patterning and imaging with electrons: assessing multi-beam SEM for e-beam structured CMOS samples
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Abstract
Electron optics can assist in the fabrication of semiconductor devices in many challenges that arise from the ongoing decrease of structure size. Examples are augmenting optical lithography by electron beam direct write strategies and high-throughput imaging of patterned structures with multiple beam electron microscopes. We use multiple beam electron microscopy to image semiconductor wafers processed by electron beam lithography.
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Tomasz Garbowski, Tomasz Garbowski, Friedhelm Panteleit, Friedhelm Panteleit, Gregor Dellemann, Gregor Dellemann, Manuela Gutsch, Manuela Gutsch, Christoph Hohle, Christoph Hohle, Elke Reich, Elke Reich, Matthias Rudolph, Matthias Rudolph, Katja Steidel, Katja Steidel, Xaver Thrun, Xaver Thrun, Dirk Zeidler, Dirk Zeidler, } "Patterning and imaging with electrons: assessing multi-beam SEM for e-beam structured CMOS samples", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97781V (8 March 2016); doi: 10.1117/12.2225501; https://doi.org/10.1117/12.2225501
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