In this paper, we propose a new generation of software platform and development infrastructure which can integrate specific metrology business modules. For example, we will show the integration of a chemistry module dedicated to electronics materials like Direct Self Assembly features. We will show a new generation of image analysis algorithms which are able to manage at the same time defect rates, images classifications, CD and roughness measurements with high throughput performances in order to be compatible with HVM. In a second part, we will assess the reliability, the customization of algorithm and the software platform capabilities to follow new specific semiconductor metrology software requirements: flexibility, robustness, high throughput and scalability. Finally, we will demonstrate how such environment has allowed a drastic reduction of data analysis cycle time.
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A. Dervilllé, A. Labrosse, Y. Zimmermann, J. Foucher, R. Gronheid, C. Boeckx, A. Singh, P. Leray, S. Halder, "Next generation of decision making software for nanopatterns characterization: application to semiconductor industry," Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 977836 (24 March 2016);