Translator Disclaimer
8 March 2016 Excursion detection using leveling data
Author Affiliations +
Wafer leveling data are usually used inside the exposure tool for ensuring good focus, then discarded. This paper describes the implementation of a monitoring and analysis solution to download these data automatically, together with the correction profiles applied by the scanner. The resulting height maps and focus residuals form the basis for monitoring metrics tailored to catching tool and process drifts and excursions in a high-volume manufacturing (HVM) environment.

In this paper, we present four six cases to highlight the potential of the method: wafer edge monitoring, chuck drift monitoring, correlations between focus residuals and overlay errors, and pre-process monitoring by chuck fingerprint removal.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
MinGyu Kim, Jaewuk Ju, Boris Habets, Georg Erley, Enrico Bellmann, and Seop Kim "Excursion detection using leveling data", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97783O (8 March 2016);

Back to Top