9 March 2016 Proposed approach to drive wafer topography for advanced lithography
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Abstract
One requirement for advanced lithography remains suitable incoming wafer topography. We propose that local wafer flatness be visualized and quantified using the techniques developed for wafer front-surface nanotopography. This is a significant change in that existing wafer topography metrology tools do not enable our proposed approach.
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John F. Valley, John F. Valley, Andrey Melnikov, Andrey Melnikov, John A. Pitney, John A. Pitney, } "Proposed approach to drive wafer topography for advanced lithography", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97783X (9 March 2016); doi: 10.1117/12.2214627; https://doi.org/10.1117/12.2214627
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