21 March 2016 Systematic investigation of the synthesis, characterization and switching mechanism of metal oxide nanoparticle resists
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Abstract
Metal oxide nanoparticle resists have recently emerged as next generation photoresist materials which exhibit promising performance for extreme ultraviolet lithography. In this present work, we are able to show our ability to synthesize and well characterize small uniform metal oxide nanoparticles, to present stability study of the nanoparticles in the resist solvent over time, to pattern ~20 nm features by electron beam lithography, and to provide an insight into the insolubilization mechanism of the resist system.
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Meiliana Siauw, Meiliana Siauw, Ke Du, Ke Du, David Valade, David Valade, Peter Trefonas, Peter Trefonas, James W. Thackeray, James W. Thackeray, Andrew Whittaker, Andrew Whittaker, Idriss Blakey, Idriss Blakey, "Systematic investigation of the synthesis, characterization and switching mechanism of metal oxide nanoparticle resists", Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 97790J (21 March 2016); doi: 10.1117/12.2219638; https://doi.org/10.1117/12.2219638
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